In semiconductors, insulation breakdown occurs in the insulating layer or PN junction due to surges or short-term high voltages, and is one of the causes of failure in semiconductor devices.
Principle of insulation breakdown
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Surge breakdown occurs when a momentary high voltage pushes the insulating material (e.g., silicon dioxide, polyimide, epoxy, etc.) or PN junction of a semiconductor beyond its withstanding limit.
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Avalanche breakdown and Zener breakdown are representative examples. Avalanche breakdown occurs when electrons are accelerated by a high-frequency electric field, dislodging other electrons within the lattice, resulting in a surge in current. Zener breakdown occurs in highly doped diodes when electrons tunnel under a strong electric field at low voltage.
Major types of damage
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Pinhole formation in insulating layers such as silicon oxide films → Increased leakage current in the long term, leading to gradual failure.
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PN junction insulation breakdown in semiconductors → loss of device function, heat dissipation, and additional damage as large amounts of current flow.
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Arcing and leakage current within multilayer insulation within PCB or integrated circuit → Gradually deteriorating insulation, which can lead to fatal open/short failure.
Typical conditions of occurrence
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Lightning and switching surge : A momentary high voltage of tens to hundreds of kV is applied when the breakdown threshold is exceeded depending on the silicon oxide film thickness, insulator quality, and joint type.
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Accumulation of repetitive voltage stress : possible degradation of insulation durability, long-term aging, and fatigue failure.
Protection and Prevention
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Install surge protection devices (SPDs) : Block transient voltages and reduce the risk of insulation breakdown.
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Increase insulation thickness and apply high-quality insulation materials when designing devices : Thick insulation materials (e.g., 400 μm polyimide) can withstand up to 10 kV.
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Design of an arc/voltage distribution structure within the device : Minimizes thermal and electrical effects caused by repetitive surges and arcs.
Reference Table (Examples of Destruction Methods and Thresholds)
Destruction type |
Source |
Critical voltage/characteristics |
How to protect |
Avalanche (MOSFET, Diode) |
reverse voltage surge |
BVDSS (MOSFET) |
SPD, increased insulation thickness |
Zener (Diode) |
High-level doping/tunneling |
Dozens to hundreds of V |
Design utilization |
Destruction of oxide film |
Power outages, surges, and prolonged stress |
tens of V to several kV |
SPD, improving insulation quality |
Internal arc/leak |
High energy/repetitive stress |
Increased leakage current |
Improved internal circuit design |